This file type includes high-resolution graphics and schematics when applicable. Michael White, Director of Product Marketing, Calibre Physical Verification products, Mentor Graphics In recent years, ...

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

As design nodes drop below 45nm, design rules are exploding in number and complexity, making design rule checking (DRC) harder and lengthier. What we have observed across the industry is that the ...