B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV ...

Intel's foundry arm says it has crossed a major lithography milestone: it has announced successful acceptance testing of ASML ...

Intl completes second-generation High Numerical Aperture (High-NA) extreme ultraviolet (EUV) lithography system testing.

Reuters reports that scientists in China have created a prototype of a machine that could eventually be used to produce ...

Intel recently confirmed the latest results in its partnership with ASML. The US chipmaker worked with engineers from the European corporation to install, test, and validate ...

Intel Foundry announced that it has managed to install the world's most advanced EUV machine—ASML's TWINSCAN EXE:5200B High-NA EUV scanner—in its facilities. The company is producing its 14A node ...

TAIPEI (Taiwan News) — China has built and begun testing a prototype extreme ultraviolet lithography (EUV) machine in a ...

Intel has completed acceptance testing of the industry's first commercial high-NA EUV lithography system with a numerical ...

The US Department of Commerce has signed a preliminary letter of intent to provide up to $150 million to xLight, a Palo Alto-based startup led by former Intel chief Pat Gelsinger, that is working on ...

Intel Corp. today claimed two significant milestones in the development of extreme-ultraviolet (EUV) lithography through the installation of the world’s first commercial EUV lithography tool and EUV ...

ASML provided Intel, its first customer, with the $380 million Twinscan EXE:5000 High-NA lithography machine. Yesterday, it shipped its second High-NA EUV lithography machine to a mystery customer.